The global Extreme Ultraviolet Lithography (EUVL) market size was USD 3.12 Billion in 2021 and is expected to register a revenue CAGR of 27.07% during the forecast period, according to the latest analysis by Emergen Research. The rising demand for Laser Produced Plasma (LPP) for light sourcing is projected to support market revenue growth between 2021 and 2030. To accelerate particles and produce brief x-ray bursts, laser-produced plasmas are used. In addition, they help simulate astronomical plasmas in laboratories. Molten tin droplets around 25 microns in diameter are blasted from a generator at 70 meters per second in an LPP source. The droplets are initially hit by a weak laser pulse as they descend, which gives them a pancake shape. The flattened droplet is then vaporized by a stronger laser pulse, forming a plasma that releases EUV light. This procedure is carried out 50,000 times per second in order to generate enough light to create microchips. LPP has high output power and Conversion Efficiency (CE), which makes them a promising alternative for EUVL sources. For example, the NXE:3400B EUV scanner setting CO2 LPP system from ASML is now deployed and in use by chipmaker customers.
The Global Extreme Ultraviolet Lithography Market Market Research Report, recently added to Emergen Research’s expanding repository, is a comprehensive document offering crucial insights into the Extreme Ultraviolet Lithography Market market and its most significant elements. Compiled through thorough primary and secondary research, the report aims to equip businesses and readers with a competitive edge, helping them stay ahead of the curve. By analyzing various aspects of the market, including current trends, growth potential, and key challenges, the report serves as a valuable resource for strategizing and decision-making.
In addition to an in-depth exploration of market dynamics, the report also sheds light on the competitive landscape, profiling major players in the Extreme Ultraviolet Lithography Market market. The detailed analysis covers market shares, business strategies, product portfolios, and recent developments in the industry. With the rapidly evolving nature of this sector, the report ensures that businesses remain informed and ready to capitalize on emerging opportunities.
The report also talks about the expansions these prominent players are vying for in the key regions of the market. The report focuses on the detailed analysis of the technological and product developments undertaken by these companies.
The key companies studied in the report are:
ASML, Tokyo Electron Limited, Samsung, Taiwan Semiconductor Manufacturing Company, Intel Corporation, NTT Advanced Technology Corporation, Nikon Corporation, Toshiba Corporation, Toppan Inc., Canon Inc., and ZEISS International
Competitive Terrain:
The Global Extreme Ultraviolet Lithography Market Market is highly consolidated due to the presence of a large number of companies across this industry. The report discusses the current market standing of these companies, their past performances, demand and supply graph, production and consumption patterns, sales network, distribution channels, and growth opportunities in the market at length.
The report bifurcates the Extreme Ultraviolet Lithography Market Market on the basis of different product types, applications, end-user industries, and key regions of the world where the market has already established its presence. The report accurately offers insights into the supply-demand ratio and production and consumption volume of each segment.
Equipment Outlook (Revenue, USD Billion; 2019–2030)
Light Source
Mask
Mirrors
Others
End-Use Outlook (Revenue, USD Billion; 2019–2030)
Integrated Device Manufacturers (IDMs)
Foundry
Others
Regional Outlook (Revenue, USD Billion; 2019–2030)
North America
U.S.
Canada
Mexico
Europe
Germany
France
U.K.
Italy
Spain
Benelux
Rest of Europe
Asia Pacific
China
India
Japan
South Korea
Rest of APAC
Latin America
Brazil
Rest of LATAM
Middle East & Africa
Saudi Arabia
UAE
South Africa
Turkey
Rest of Middle East & Africa
Regional Outlook :
Global growth across the Extreme Ultraviolet Lithography Market Market is shaped by varying regional dynamics. North America and Europe are at the forefront, benefiting from technological innovations and robust regulatory standards, though challenges such as supply chain interruptions and regulatory compliance remain. In Asia-Pacific, notably China and India, rapid urbanization and growing consumer markets are driving significant expansion. Simultaneously, Latin America, the Middle East, and Africa offer emerging growth opportunities, fueled by economic reforms and increased investment, although political instability and inadequate infrastructure hinder sustained progress.
The report addresses the following key points:
The report estimates the expected market size from 2020-2027
The report provides a forecast of market drivers, restraints, and future opportunities for the Extreme Ultraviolet Lithography Market market
The report further analyses the changing market dynamics
Regional analysis and segmentation of the market with analysis of the regions and segments expected to dominate the market growth
Extensive competitive landscape mapping with profiles of the key competitors
In-depth analysis of business strategies and collaborations such as mergers and acquisitions adopted by the key companies
Revenue forecast, country scope, application insights, and product insights
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